INVESTIGATION OF HOT-FILAMENT AND HOLLOW-CATHODE ELECTRON-BEAM TECHNIQUES FOR ION PLATING

被引：13

作者：

WAN, CT

CHAMBERS, DL

CARMICHAEL, DC

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1971年 / 8卷 / 06期

关键词：

D O I：

10.1116/1.1315418

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：VM99 / +

页数：1

共 10 条

[1] CHAMBERS DL, 1971, RES DEV, V22, P32
[2] The Application of the Glow Discharge to Material Processing
Dugdale, R. A.
[J]. JOURNAL OF MATERIALS SCIENCE, 1966, 1 (02) : 160 - 169
[3] GLOW DISCHARGE BEAM TECHNIQUES
DUGDALE, RA
MASKREY, JT
FORD, SD
HARMER, PR
LEE, RE
[J]. JOURNAL OF MATERIALS SCIENCE, 1969, 4 (04) : 323 - +
[4] HIGHLY IONIZED HOLLOW CATHODE DISCHARGE
LIDSKY, LM
ROSE, DJ
YOSHIKAWA, S
ROTHLEDER, SD
MACKIN, RJ
MICHELSON, C
[J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (08) : 2490 - &
[5] MATTOX DM, 1963, SCDR28163 SAND CORP
[6] MORLEY JR, 1963, 5 P EL BEAM S ANN M, P368
[7] MULY EC, 1965, 1ST P 1964 INT EL IO, P133
[8] POORMAN RM, 1969, 15 NAT SAMPE S EXH L, P633
[9] STAUFFER LH, 1963, 5 P EL BEAM ANN M, P345
[10] VANPAASEN HLL, 1962, P NATIONAL ELECTRONI, P590