DIFFUSION IN RANDOM STRUCTURES WITH A TOPOLOGICAL BIAS

被引：32

作者：

BUNDE, A

HAVLIN, S

STANLEY, HE

TRUS, B

WEISS, GH

机构：

[1] BOSTON UNIV,DEPT PHYS,BOSTON,MA 02215

[2] UNIV CONSTANCE,FAK PHYS,D-7750 CONSTANCE,FED REP GER

[3] BAR ILAN UNIV,DEPT PHYS,RAMAT GAN,ISRAEL

[4] NIH,DIV COMP RES & TECHNOL,BETHESDA,MD 20205

来源：

PHYSICAL REVIEW B | 1986年 / 34卷 / 11期

关键词：

D O I：

10.1103/PhysRevB.34.8129

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：8129 / 8132

页数：4

共 23 条

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