CHARACTERIZATION OF PARASEXIPHENYL THIN-FILMS DEPOSITED UNDER VACUUM

The study of parasexiphenyl thin films deposited under vacuum indicate that deposition parameters - such as evaporation rate, substrate temperature - play a major role. Here we show that the best cristallinity is obtained with a high substrate temperature and a very low evaporation rate. A texture shows up under these experimental conditions, the axis of the parasexiphenyl molecules being normally to the substrate surface.