PROPERTIES OF CO/PD MULTILAYERS PREPARED BY UHV PHYSICAL VAPOR-DEPOSITION

被引:3
作者
LEE, YP [1 ]
KIM, SK [1 ]
KANG, JS [1 ]
KOO, YM [1 ]
JEONG, JI [1 ]
HONG, JH [1 ]
SHIN, HJ [1 ]
机构
[1] POHANG INST SCI & TECHNOL,POHANG,SOUTH KOREA
关键词
D O I
10.1016/0304-8853(93)90613-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Co/Pd multilayer films with a few atomic layers of Co were prepared on Si wafers by alternating deposition in an ultrahigh-vacuum physical vapor deposition system. The ultrathin structural parameters were measured accurately using only the angular positions of the X-ray diffraction peaks. The magnetic and magneto-optical properties were found to vary greatly depending on Pd predeposition and Pd sublayer thicknesses as well as Co sublayer thickness. The Pd-predeposited films were found to have a remarkably high coercivity of 4723 Oe and an interfacial magnetic anisotropy of 0.72 mJ/m2, which indicates their excellent potential as magneto-optical recording media.
引用
收藏
页码:316 / 319
页数:4
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