PHASE-MEASUREMENT INTERFEROMETRIC MICROSCOPY OF MICROLITHOGRAPHICALLY FABRICATED PLATINUM-ELECTRODES

Phase-measurement Interferometric microscopy (PMIM) was used to measure the topography of Pt microelectrodes fabricated on silicon wafers. Disk (10 μm radius) and band (10 μm X 1000 μm) electrodes were prepared by deposition and lithographic patterning of a 0.2 μm thick SIO2 layer on a 0.05 μm thick Pt film. Quantitative topographical images of the resulting electrodes are obtained from PMIM by accounting for the complex refractive index of Pt and for multiple reflections of light which occur within the transparent SIO2 layer. In situ, quantitative measurement of microelectrode topography in water is also demonstrated. © 1990, American Chemical Society. All rights reserved.