CHEMICAL-PROPERTIES OF POLYMER-FILMS FORMED DURING THE ETCHING OF ALUMINUM IN CCL4 PLASMAS

被引：16

作者：

NAGY, AG ^{[1
]}

HESS, DW ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY,DEPT CHEM ENGN,BERKELEY,CA 94720

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 11期

关键词：

D O I：

10.1149/1.2123599

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2530 / 2533

页数：4

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