ION-BEAM ASSISTED ETCHING OF SEMICONDUCTORS

被引：46

作者：

ZALM, PC

机构：

来源：

关键词：

D O I：

10.1016/0042-207X(86)90113-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：787 / 797

页数：11

共 105 条

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