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ION-BEAM ASSISTED ETCHING OF SEMICONDUCTORS

被引：46
作者：
ZALM, PC
机构：
来源：
VACUUM | 1986年 / 36卷 / 11-12期
关键词：
D O I：
10.1016/0042-207X(86)90113-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：787 / 797
页数：11
相关论文
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