APPLICATION OF SELECTIVE CHEMICAL-REACTION CONCEPT FOR CONTROLLING THE PROPERTIES OF OXIDES ON GAAS

被引:39
作者
CHANG, RPH
COLEMAN, JJ
POLAK, AJ
FELDMAN, LC
CHANG, CC
机构
[1] Bell Laboratories, Murray Hill
关键词
D O I
10.1063/1.90750
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrate how GaAs can be selectively oxidized in a plasma to control the physical and chemical properties of the oxides. Electrical measurements indicate that charged traps can be removed.
引用
收藏
页码:237 / 238
页数:2
相关论文
共 10 条
[1]   ANODIC OXIDE ON GAAS - QUANTITATIVE CHEMICAL DEPTH PROFILES OBTAINED USING AUGER-SPECTROSCOPY AND NEUTRON-ACTIVATION ANALYSIS [J].
CHANG, CC ;
SCHWARTZ, B ;
MURARKA, SP .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (06) :922-926
[2]   PLASMA-GROWN OXIDE ON GAAS - SEMI-QUANTITATIVE CHEMICAL DEPTH PROFILES OBTAINED USING AUGER-SPECTROSCOPY AND NEUTRON-ACTIVATION ANALYSIS [J].
CHANG, CC ;
CHANG, RPH ;
MURARKA, SP .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) :481-487
[3]   PLASMA OXIDATION OF GAAS [J].
CHANG, RPH ;
SINHA, AK .
APPLIED PHYSICS LETTERS, 1976, 29 (01) :56-58
[4]   PLASMA OXIDATION OF ALUMINUM FILM ON GAAS - STUDY BY AUGER-SPECTROSCOPY AND TRANSMISSION ELECTRON-MICROSCOPY [J].
CHANG, RPH ;
CHANG, CC ;
SHENG, TT .
APPLIED PHYSICS LETTERS, 1977, 30 (12) :657-659
[5]   MULTIPURPOSE PLASMA REACTOR FOR MATERIALS RESEARCH AND PROCESSING [J].
CHANG, RPH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01) :278-280
[6]   NEW METHOD OF FABRICATING GALLIUM-ARSENIDE MOS DEVICES [J].
CHANG, RPH ;
COLEMAN, JJ .
APPLIED PHYSICS LETTERS, 1978, 32 (05) :332-333
[7]   EFFECT OF INTERFACE ARSENIC DOMAINS ON ELECTRICAL-PROPERTIES OF GAAS MOS STRUCTURES [J].
CHANG, RPH ;
SHENG, TT ;
CHANG, CC ;
COLEMAN, JJ .
APPLIED PHYSICS LETTERS, 1978, 33 (04) :341-342
[8]  
DELABRETEQUE P, 1976, GALLIUM, P55
[9]   ANALYSIS OF PLASMA-GROWN GAAS OXIDE-FILMS [J].
KAUFFMAN, RL ;
FELDMAN, LC ;
POATE, JM ;
CHANG, RPH .
APPLIED PHYSICS LETTERS, 1977, 30 (07) :319-321
[10]  
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