MULTIFUNCTION OF ALUMINUM NITRIDE THIN-FILMS DEPOSITED ON MOSI2 SUBSTRATES - CERAMIC SKIN

被引：16

作者：

AKIYAMA, M

NONAKA, K

SHOBU, K

WATANABE, T

机构：

[1] Kyushu Natl Industrial Research Inst, Tosu-shi

来源：

JOURNAL OF THE CERAMIC SOCIETY OF JAPAN | 1995年 / 103卷 / 09期

关键词：

SPUTTERING; ALN THIN FILM; POLYCRYSTALLINE SUBSTRATES; MOSI2; ORIENTATION; CERAMIC SKIN;

D O I：

10.2109/jcersj.103.974

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Highly oriented AlN thin films were prepared on polycrystalline MoSi2 substrates by rf magnetron sputtering. The films responded to mechanical impact and produced voltage. The maximum produced voltage increased almost linearly with the impact intensity. Furthermore, the capacitance of the films increased almost linearly with applied pressure, indicating that the films can measure the pressure. The films responded to thermal shock. These results suggested that the films possessed various functions like human skin.

引用

页码：974 / 976

页数：3

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