PROPERTIES OF HYDROGENATED AMORPHOUS-SILICON PREPARED BY ECR PLASMA CVD METHOD

被引：25

作者：

KITAGAWA, M

SETSUNE, K

MANABE, Y

HIRAO, T

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1988年 / 27卷 / 11期

关键词：

D O I：

10.1143/JJAP.27.2026

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2026 / 2031

页数：6

共 16 条

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