SCANNING TUNNELING MICROSCOPY OF ION IMPACTS ON SEMICONDUCTOR SURFACES

被引：39

作者：

WILSON, IH

ZHENG, NJ

KNIPPING, U

TSONG, IST

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 04期

关键词：

D O I：

10.1116/1.576155

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2840 / 2844

页数：5

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