PROPERTIES OF THE ABLATION PROCESS FOR EXCIMER LASER ABLATION OF Y1BA2CU3O7

被引：16

作者：

NEIFELD, RA

POTENZIANI, E

SINCLAIR, WR

HILL, WT

TURNER, B

PINKAS, A

机构：

[1] MARTIN GOFFMAN ASSOCIATES,EDISON,NJ 08820

[2] UNIV MARYLAND,INST PHYS SCI & TECHNOL,COLLEGE PK,MD 20742

来源：

JOURNAL OF APPLIED PHYSICS | 1991年 / 69卷 / 02期

关键词：

D O I：

10.1063/1.347380

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The process of excimer laser ablation has been studied while varying the laser fluence from 0.237 to 19.1 J/cm2. Ion time-of-flight, total charge, target etch depth per pulse, and etch volume per pulse have been measured. Results indicate a maximum ablation volume and minimum ionization fraction occur near 5 J/cm2. Several of the parameters measured vary rapidly in the 1-5 J/cm2 range. Variation in these parameters strongly influences the properties of films grown by this technique.

引用

页码：1107 / 1109

页数：3

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