REFLECTANCE OF SILICON-CARBIDE IN THE VACUUM ULTRAVIOLET

被引：19

作者：

KELLY, MM ^{[1
]}

WEST, JB ^{[1
]}

LLOYD, DE ^{[1
]}

机构：

[1] BRITISH CERAM RES ASSOC,STOKE ON TRENT ST4 7LQ,STAFFORDSHIRE,ENGLAND

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1981年 / 14卷 / 03期

关键词：

D O I：

10.1088/0022-3727/14/3/010

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：401 / &

共 12 条

[1] SIC, A NEW MATERIAL FOR MIRRORS .1. HIGH-POWER LASERS .2. VUV APPLICATIONS [J].

CHOYKE, WJ ;

FARICH, RF ;

HOFFMAN, RA .

APPLIED OPTICS, 1976, 15 (09) :2006-2007

[2] REFLECTANCE AND OPTICAL-CONSTANTS OF EVAPORATED OSMIUM IN VACUUM ULTRAVIOLET FROM 300 TO 2000 A [J].

COX, JT ;

HASS, G ;

RAMSEY, JB ;

HUNTER, WR .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1973, 63 (04) :435-438

[3]

LLOYD DE, 1968, SPECIAL CERAMICS, V4, P103

[4]

MARR GV, 1980, J PHYS B-AT MOL OPT, V13, P283, DOI 10.1088/0022-3700/13/2/016

[5]

Popper P., 1961, POWDER METALL, V4, P113, DOI [10.1179/pom.1961.4.8.009, DOI 10.1179/POM.1961.4.8.009]

[6]

Popper P., 1965, SPECIAL CERAMICS 196, P45

[7] A METHOD FOR MEASURING POLARIZATION IN VACUUM ULTRAVIOLET [J].

RABINOVITCH, K ;

CANFIELD, LR ;

MADDEN, RP .

APPLIED OPTICS, 1965, 4 (08) :1005-+

[8]

Rehfeld N., 1973, Applied Physics, V1, P229, DOI 10.1007/BF00884674

[9] TOTAL INTEGRATED OPTICAL SCATTERING IN VACUUM UV - POLISHED CVD SIC [J].

REHN, V ;

STANFORD, JL ;

BAER, AD ;

JONES, VO ;

CHOYKE, WJ .

APPLIED OPTICS, 1977, 16 (05) :1111-1112

[10]

REHN V, 1980, 1979 JAP US SEM SYNC

← 1 2 →