ULTRAVIOLET STABILITY AND CONTAMINATION ANALYSIS OF SPECTRALON DIFFUSE REFLECTANCE MATERIAL

被引：65

作者：

STIEGMAN, AE ^{[1
]}

BRUEGGE, CJ ^{[1
]}

SPRINGSTEEN, AW ^{[1
]}

机构：

[1] LABSPHERE INC,N SUTTON,NH 03264

来源：

OPTICAL ENGINEERING | 1993年 / 32卷 / 04期

关键词：

SPECTRALON; POLYTETRAFLUOROETHYLENE; DIFFUSE REFLECTANCE STANDARDS; CALIBRATION; FLIGHT QUALIFICATION; SPACE EXPOSURE ENVIRONMENTAL TESTING; MULTIANGLE IMAGING SPECTRORADIOMETER (MISR); EARTH OBSERVING SYSTEM;

D O I：

10.1117/12.132374

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A detailed chemical analysis was carried out on Spectralon, a highly Lambertian, diffuse reflectance material. Results of this investigation unambiguously identified the presence of an organic (hydrocarbon) impurity intrinsic to the commercial material. This impurity could be removed by a vacuum bake-out procedure and was identified as the cause of optical changes (degradation) that occur in the material when exposed to UV light. It was found that when this impurity was removed, the Spectralon material was photochemically stable and maintained its reflectance properties even after extensive solar UV exposure.

引用

页码：799 / 804

页数：6