TEMPERATURE-DEPENDENCE OF PLANAR CHANNELING RADIATION

被引：16

作者：

PARK, H

KEPHART, JO

KLEIN, RK

PANTELL, RH

HYNES, MV

BERMAN, BL

DAHLING, BA

DATZ, S

SWENT, RL

ALGUARD, MJ

机构：

[1] UNIV CALIF LOS ALAMOS NATL LAB,LOS ALAMOS,NM 87545

[2] GEORGE WASHINGTON UNIV,DEPT PHYS,WASHINGTON,DC 20052

[3] OAK RIDGE NATL LAB,OAK RIDGE,TN 37830

[4] UNIV CALIF LAWRENCE LIVERMORE NATL LAB,LIVERMORE,CA 94550

[5] IMATRON INC,S SAN FRANCISCO,CA 94080

[6] MEASUREX INC,CUPERTINO,CA 95015

来源：

PHYSICAL REVIEW B | 1987年 / 35卷 / 01期

关键词：

D O I：

10.1103/PhysRevB.35.13

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：13 / 17

页数：5

共 9 条

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[9]

Park H., UNPUB

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