MECHANISM OF DIFFUSION OF COPPER IN GERMANIUM

[1] COPPER PRECIPITATION ON DISLOCATIONS IN SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1956, 27 (10) : 1193 - 1195

[2] FULLER, 1954, PHYS REV, V93, P1182

[3] LETAW, 1954, PHYS REV, V93, P892

[4] MOBILITY OF IMPURITY IONS IN GERMANIUM AND SILICON [J]. PHYSICAL REVIEW, 1953, 92 (05): : 1322 - 1323

[5] STRUCTURE SENSITIVITY OF CU DIFFUSION IN GE [J]. PHYSICAL REVIEW, 1956, 103 (03): : 828 - 828

[6] TWEET AG, COMMUNICATION

[7] ON THE BEHAVIOR OF RAPIDLY DIFFUSING ACCEPTORS IN GERMANIUM [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1955, 102 (05) : 229 - 234

[1] COPPER PRECIPITATION ON DISLOCATIONS IN SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1956, 27 (10) : 1193 - 1195

[2] FULLER, 1954, PHYS REV, V93, P1182

[3] LETAW, 1954, PHYS REV, V93, P892

[4] MOBILITY OF IMPURITY IONS IN GERMANIUM AND SILICON [J]. PHYSICAL REVIEW, 1953, 92 (05): : 1322 - 1323

[5] STRUCTURE SENSITIVITY OF CU DIFFUSION IN GE [J]. PHYSICAL REVIEW, 1956, 103 (03): : 828 - 828

[6] TWEET AG, COMMUNICATION

[7] ON THE BEHAVIOR OF RAPIDLY DIFFUSING ACCEPTORS IN GERMANIUM [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1955, 102 (05) : 229 - 234