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Hall effect and specific resistance of evaporated films of silver, copper and iron

被引：19
作者：
Steinberg, JC [1 ]
机构：
[1] State Univ Iowa, Phys Lab, Ames, IA USA
来源：
PHYSICAL REVIEW | 1923年 / 21卷 / 01期
关键词：
D O I：
10.1103/PhysRev.21.22
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：22 / 29
页数：8
相关论文
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