THE SYNTHESIS, CHARACTERIZATION, AND PHOTOINITIATED CATIONIC POLYMERIZATION OF SILICON-CONTAINING EPOXY-RESINS

被引:146
作者
CRIVELLO, JV
LEE, JL
机构
[1] General Electric Corporate Research and Development, Schenectady, New York, 12301
[2] Rensselaer Polytechnic Institute, Troy, New York
关键词
D O I
10.1002/pola.1990.080280303
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The preparation of a variety of silicon‐containing epoxy monomers and oligomers is described and their reactivity in photoinitiated cationic polymerization examined. Monomers and oligomers having terminal cycloaliphatic epoxy groups were found to be especially reactive in cationic polymerization. These materials are attractive candidates for use in coatings, adhesives, and elastomers. Copyright © 1990 John Wiley & Sons, Inc.
引用
收藏
页码:479 / 503
页数:25
相关论文
共 24 条
  • [1] ANDRIANOV KA, 1963, VYSOKOMOL SOEDIN A+, V3, P1074
  • [2] Bailey D. L., 1961, [No title captured], Patent No. [US2970150, 2970150]
  • [3] SYNTHESIS OF 2-SUBSTITUTED CHROMONES, CHROMANONES, AND THEIR THIO ANALOGS USING ORGANOCOPPER REAGENTS
    CLARKE, PD
    FITTON, AO
    SUSCHITZKY, H
    WALLACE, TW
    DOWLATSHAHI, HA
    SUSCHITZKY, JL
    [J]. TETRAHEDRON LETTERS, 1986, 27 (01) : 91 - 94
  • [4] Crivello J.V., 1979, ACS SYM SER, V114, P1, DOI [10.1021/bk-1979-0114.ch001, DOI 10.1021/BK-1979-0114.CH001]
  • [5] CRIVELLO JV, 1980, CHEMTECH, V10, P624
  • [6] CRIVELLO JV, 1984, ADV POLYM SCI, V62, P1
  • [7] CRIVELLO JV, 1977, J RADIAT CURING, V4, P1
  • [8] ECKBERG RP, 1983, Patent No. 4421904
  • [9] KORNILOVA YI, 1967, Patent No. 202524
  • [10] Lamoreaux H. F., 1965, Patent No. [US3,197,432, 3197432]