DIAMOND MEMBRANES FOR X-RAY MASKS

被引：7

作者：

LOCHEL, B

SCHLIWINSKI, HJ

HUBER, HL

TRUBE, J

SCHAFER, L

KLAGES, CP

LUTHJE, H

机构：

[1] Fraunhofer-Institut für Mikrostrukturtechnik (IMT), D-1000 Berlin 33

[2] Fraunhofer-Institut für Schicht- und Oberflächentechnik (IST), D-2000 Hamburg 54

[3] Philips Forschungslaboratorium Hamburg, D-2000 Hamburg 54

来源：

MICROELECTRONIC ENGINEERING | 1992年 / 17卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(92)90036-Q

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Diamond is intensively under discussion as membrane material for X-ray masks. Its high optical transparency and its high thermal conductivity, its very low thermal expansion coefficient and its high Young's modulus favours diamond over other materials. The deposition of diamond layers was performed utilizing a plasma activated chemical vapor deposition in a substrate temperature range of 800 to 850-degrees-C. The optical transparency of diamond membranes at 630 nm, determined by spectral photometry, was found to be about 38% for a 3.6-mu-m thick membrane. The surface roughness of diamond layers, measured by an atomic force microscope, is about 50 nm. Further results of diamond mask blanks concerning thickness homogeneity and radiation stability are reported.

引用

页码：175 / 179

页数：5

共 6 条

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[6]

Lochel, Chlebek, Grimm, Huber, Maciossek, Silicon Membrane Mask Blanks for X-Ray and Ion Projection Lithography, Japanese Journal of Applied Physics, 29, 11, pp. 2605-2609, (1990)

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