ELECTROLESS DEPOSITION OF NI-P ALLOYS WITH AND WITHOUT THE USE OF SUPERIMPOSED PULSED CURRENT

被引：33

作者：

MARSHALL, GW

LEWIS, DB

DODDS, BE

机构：

[1] Sheffield City Polytechnic, Materials Research Institute, Sheffield

来源：

SURFACE & COATINGS TECHNOLOGY | 1992年 / 53卷 / 03期

关键词：

D O I：

10.1016/0257-8972(92)90380-S

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The electroless deposition of Ni-P alloys from a hypophosphite bath with and without the use of superimposed pulsed current has been studied. Use of superimposed pulsed current was found to increase the rate of deposition from the bath and smooth bright deposits were obtained using current densities up to 20 mA cm-2 with an on-to-off ratio of 10 to 100 milliseconds. The hardness of deposits increased following heat treatment at 400-degrees-C and deposits obtained with superimposed current were generally harder than those produced by electroless deposition only. X-ray studies of heat-treated deposits showed that Ni3P, Ni5P2 and Ni12P5 phases were present in deposits produced using pulse current but, whereas electroless deposits also contained these phases, the volume fractions of Ni12P5 and Ni5P2 were much less than in the former.

引用

页码：223 / 230

页数：8

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