LARGE 3RD-ORDER OPTICAL NONLINEARITY OF TIN MICROCRYSTALLITE-DOPED SILICA GLASS FORMED BY ION-IMPLANTATION

被引：37

作者：

TAKEDA, Y

HIOKI, T

MOTOHIRO, T

NODA, S

机构：

[1] Toyota Central Research and Development Laboratories, Inc., Aichi-gun, Aichi-ken 480-11, Nagakute-cho

来源：

APPLIED PHYSICS LETTERS | 1993年 / 63卷 / 25期

关键词：

D O I：

10.1063/1.110159

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Sn+ ions were implanted into silica glass at an acceleration energy of 400 keV to a dose of 2 X 10(17) ions/cm2. Metallic Sn microcrystallites of 4-20 nm in diameter were formed to attain the average volume fraction of 28%. The dielectric function, epsilon, and the absolute value of the third-order optical nonlinear susceptibility, \chi(3)\, showed dispersions around a wavelength of 500 nm, owing to surface plasmon resonance. The difference in the peak width of \chi(3)\ and the imaginary part of epsilon can be explained by an effective medium theory. The maximum of \chi(3)\ was 3 X 10(-6) esu, which is as large as those reported for semiconductor-doped glasses.

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页码：3420 / 3422

页数：3

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