EVALUATION OF THE ELECTRON-CYCLOTRON RESONANCE PLASMA PROCESS USING A MICROWAVE TWIN-LEAD LINE PROBE

被引：2

作者：

NISHIMURA, H

MATSUO, S

机构：

[1] NTT LSI Laboratories, Nippon Telegraph and Telephone Corporation, Atsugi-shi, Kanagawa

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1991年 / 30卷 / 10A期

关键词：

PLASMA MEASUREMENT METHOD; PARALLEL TWIN-LEAD LINE PROBE; MICROWAVE; ECR PLASMA;

D O I：

10.1143/JJAP.30.L1767

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A plasma measurement method using a parallel twin-lead line probe is developed. An accurate measurement of process plasma such as electron cyclotron resonance plasma can be made even in the presence of an external magnetic field by this method. Measurement errors are estimated to be less than +/- 10% considering the influence of the electron density distribution and the multiple reflection between the plasma boundaries. The density of electron cyclotron resonance plasma is measured by the method and a high ionization degree of 1 to 10% is confirmed.

引用

页码：L1767 / L1769

页数：3

共 9 条

[1] LECHER WIRE MICROWAVE INTERFEROMETER FOR MEASUREMENTS OF ELECTRON DENSITY AND ELECTRON-TEMPERATURE IN A FLOWING TRANSIENT PLASMA [J].