Plasma polymerization of sputtered poly(tetrafluoroethylene) (PTFE) using nonequilibrium helium, neon, argon, nitrogen, and hydrogen glow discharges has been followed by X-ray photoelectron spectroscopy (XPS), infrared spectroscopy, and UV emission spectroscopy. The chemical character of the resultant fluoropolymer deposits is found to be strongly influenced by the type of carrier gas employed.