ON THE TEXTURE OF ELECTROLESS COPPER-FILMS ON EPITAXIAL CU SEED LAYERS GROWN ON SI(100) AND SI(111) SUBSTRATES

The orientation control of electroless copper films on copper seed layers with different preferential orientations was investigated. Copper films, deposited by electron-beam evaporation, show an epitaxial relationship with the Si substrates, resulting in (100)- and (111)-oriented Cu films on (100) and (111) Si substrates, respectively. Ion-channeling, plan-view and cross-sectional transmission electron microscopy and x-ray diffraction have been employed to investigate the orientation dependence of the copper layers on the copper seed layers with (100) and (111) orientations and surface condition between electroless copper and E-beam copper layers.