THE INDUCTION AND REPAIR OF (6-4) PHOTOPRODUCTS IN NEUROSPORA-CRASSA

被引：11

作者：

BAKER, TI ^{[1
]}

RADLOFF, RJ ^{[1
]}

CORDS, CE ^{[1
]}

ENGEL, SR ^{[1
]}

MITCHELL, DL ^{[1
]}

机构：

[1] UNIV CALIF SAN FRANCISCO,RADIOBIOL & ENVIRONM HLTH LAB,SAN FRANCISCO,CA 94143

来源：

MUTATION RESEARCH | 1991年 / 255卷 / 03期

关键词：

(6-4) PHOTOPRODUCTS; NEUROSPORA-CRASSA;

D O I：

10.1016/0921-8777(91)90024-J

中图分类号：

Q3 [遗传学];

学科分类号：

071007 ; 090102 ;

摘要：

The (6-4) photoproduct lesion found in DNA after UV irradiation is repaired by germinating Neurospora crassa conidia. Wild-type Neurospora removes 80% of the (6-4) photoproduct in approximately 20 min and maximal repair is accomplished by 30 min with approximately 89% of the original lesions removed. Mutagen-sensitive Neurospora mutants belonging to the established excision repair epistasis group, UVS-2, are not defective in the removal of cyclobutane pyrimidine dimers. Furthermore, we find these mutants capable of removing (6-4) photoproducts from their DNA at a rate similar to wild type. Comparable kinetics are also observed in key members of the other two epistasis groups.

引用

页码：211 / 218

页数：8

共 33 条

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