REACTIVE ION ETCHING IN THE FABRICATION OF NIOBIUM TUNNEL-JUNCTIONS

被引：15

作者：

REIBLE, SA

机构：

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1981年 / 17卷 / 01期

关键词：

D O I：

10.1109/TMAG.1981.1061009

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：303 / 306

页数：4

共 10 条

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[10] PREPARATION AND LIFETEST OF NIOBIUM JOSEPHSON JUNCTION TUNNEL-DIODES AND ARRAYS [J].

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