Plasma-enhanced CVD of electrochromic materials

被引：31

作者：

Kuypers, A. D. ^{[1
]}

Spee, C. I. M. A. ^{[1
]}

Linden, J. L. ^{[1
]}

Kirchner, G. ^{[1
]}

Forsyth, J. F. ^{[1
]}

Mackor, A. ^{[1
]}

机构：

[1] TNO, Inst Appl Phys, Dept Inorgan Mat Chem, NL-5600 AN Eindhoven, Netherlands

来源：

SURFACE & COATINGS TECHNOLOGY | 1995年 / 74-75卷 / 1-3期

关键词：

electrochromism; WO3; V2O5; plasma-enhanced CVD; metal organic CVD;

D O I：

10.1016/0257-8972(95)08294-8

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Thermally and plasma-enhanced chemical vapour deposition of tungsten oxide from W( CO) 6 precursor and of vanadium oxide from VO(O(i)pr)(3) has been performed in a low pressure research reactor. Microstructural evaluation (X-ray diffraction and X-ray photoelectron spectroscopy) shows that fully oxidized layers can be obtained at high deposition rates under plasma-activated process conditions. Cyclic voltammetry indicates that, in principle, optical properties under ion intercalation are as desired for the production of electrochromic devices.

引用

页码：1033 / 1037

页数：5

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