A COMPARATIVE-STUDY OF MICROSTRUCTURE (IN ITO FILMS) AND TECHNIQUES (CTEM AND STM)

被引：14

作者：

RAUF, IA

WALLS, MG

机构：

[1] MP Group, Cavendish Laboratory, University of Cambridge, Cambridge, CB3 0HE, Madingley Road

来源：

ULTRAMICROSCOPY | 1991年 / 35卷 / 01期

关键词：

D O I：

10.1016/0304-3991(91)90040-D

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

Understanding the quantitative dependence of carrier mobility on the microstructural characteristics is a major problem in optimizing the performance of ITO films. The microstructure of ITO films is studied here by STM and TEM. Images from the two techniques are compared. Generally the images from these complementary techniques are consistent. The grain size calculated from STM images is larger than that calculated from TEM images. A possible interpretation for this difference is reported. The possibility of developing a method to give a quantitative estimate of grain boundary scattering is presented.

引用

页码：19 / 26

页数：8

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