ANODIZATION CONSTANTS FOR TANTALUM

被引：30

作者：

YOUNG, L ^{[1
]}

机构：

[1] UNIV BRITISH COLUMBIA,DEPT ELECT ENGN,VANCOUVER V6T 1W5,BRITISH COLUMBI,CANADA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 04期

关键词：

D O I：

10.1149/1.2133341

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：528 / 529

页数：2

共 14 条

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[8] STUDY OF OXYGEN GROWTH LAWS OF ANODIC OXIDE FILMS ON ALUMINUM AND TANTALUM USING NUCLEAR MICROANALYSIS OF O16 AND O18 [J].

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[9] RUTHERFORD SCATTERING ANALYSIS OF ANODIC TANTALUM-SILICON OXIDES [J].

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[10] THE KINETICS OF FORMATION AND STRUCTURE OF ANODIC OXIDE FILMS ON TANTALUM [J].

VERMILYEA, DA .

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