QUANTITATIVE DEPTH PROFILING ANALYSES OF THE SURFACE-LAYER IN BE-CU DYNODES

被引:4
作者
NAKAO, F
BIRAKAWA, M
YAMAMOTO, T
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 04期
关键词
D O I
10.1116/1.570154
中图分类号
O59 [应用物理学];
学科分类号
摘要
A programmable SIMS instrument was developed and used to perform accurate depth profiling analyses of an activated Be-Cu alloy. The instrument provides information at every 75 A under typical ion bombarding conditions, 0. 3 mu A of 8 keV **4**0Ar** plus . Analytical results indicate that the BeO of 10 wt. % or more is formed on the surface, which is composed of a reasonably homogeneous BeO layer with a thickness of the order of 300 to 500 A. The BeO spreads out toward the inner layer and reaches 5000 A or more. The Be concentration on the surface is less than 0. 2 wt. %, but at a depth of more than 3000 A it approximates the concentration of the mother body, about 1. 9 wt. %.
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页码:1017 / 1019
页数:3
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