GENERAL-ANALYSIS OF THE MODULATED-PHOTOCURRENT EXPERIMENT INCLUDING THE CONTRIBUTIONS OF HOLES AND ELECTRONS

被引:93
作者
LONGEAUD, C
KLEIDER, JP
机构
[1] Laboratoire de Génie Electrique de Paris, Ecole Supérieure d'Electricité, Université Paris VI, 91192 Gif-sur-Yvette Cedex, Plateau de Moulon
来源
PHYSICAL REVIEW B | 1992年 / 45卷 / 20期
关键词
D O I
10.1103/PhysRevB.45.11672
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper we concentrate on an analysis of the modulated photocurrent (MPC) experiment applied to samples of amorphous semiconductors built in coplanar geometry. Taking into account both types of photocarriers, the basic equations describing the modulation of the occupation of the localized states are derived according to the statistics of Simmons and Taylor. Generalized expressions for the phase shift and the modulus of the modulated photocurrent are obtained without any restrictive assumptions and discussed. It is shown that, if one type of carrier is predominant, the modulated photocurrent gives the density as well as the capture cross section of the localized states interacting with these carriers. The precise conditions under which the two-carrier system is reduced to a single-carrier system are given. The main features of the method are illustrated by means of a simulation, where we study the influence of several parameters. We show that the dominant contribution to the modulated photocurrent comes from the carrier type which presents the higher value of mu/(N-sigma), where mu is the free-carrier mobility; sigma, the capture cross section; and N, the density of trapping states for which the emission rate is equal to the angular frequency-omega at which the experiment is performed. Consequently, only the trapping states corresponding to this type of carrier can be probed. Our study underlines some possible experimental misuses of the MPC technique which could lead to erroneous results regarding the inferred density of states.
引用
收藏
页码:11672 / 11684
页数:13
相关论文
共 20 条
[1]   SENSITIVITY ANALYSIS OF THE MODULATED PHOTOCURRENT METHOD [J].
AKTAS, G ;
CIL, CZ ;
AKTULGA, E .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1989, 48 (03) :237-240
[2]   THE DENSITY OF STATES IN UNDOPED AND DOPED AMORPHOUS SILICON-GERMANIUM ALLOYS DETERMINED THROUGH PHOTOYIELD SPECTROSCOPY [J].
ALJISHI, S ;
SHU, J ;
LEY, L .
AMORPHOUS SILICON TECHNOLOGY - 1989, 1989, 149 :125-130
[3]  
BRUGGEMANN R, 1990, PHILOS MAG B, V62, P29
[4]   THE SIGN OF PHOTOCARRIERS AND THERMAL QUENCHING OF PHOTOCONDUCTIVITY IN A-SI-H [J].
FRITZSCHE, H ;
TRAN, MQ ;
YOON, BG ;
CHI, DZ .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 137 :467-470
[5]   GAP-STATES AND THEIR CAPTURE-CROSS-SECTION DISTRIBUTION IN A-SI-H STUDIED BY FREQUENCY-RESOLVED PHOTOCURRENT SPECTROSCOPY [J].
HATTORI, K ;
NIWANO, Y ;
OKAMOTO, H ;
HAMAKAWA, Y .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 137 :363-366
[6]   A NEW TREATMENT OF SCHOTTKY-BARRIER CAPACITANCE-VOLTAGE CHARACTERISTICS - DISCUSSION OF USUAL ASSUMPTIONS AND DETERMINATION OF THE DEEP GAP STATES DENSITY IN A-SI1-XGEX-H ALLOYS [J].
KLEIDER, JP ;
MENCARAGLIA, D ;
DJEBBOUR, Z .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1989, 114 :432-434
[7]   STUDY OF THE DENSITY OF STATES OF HYDROGENATED AMORPHOUS-SILICON FROM TIME-OF-FLIGHT AND MODULATED PHOTOCURRENT EXPERIMENTS [J].
KLEIDER, JP ;
LONGEAUD, C ;
GLODT, O .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 137 :447-450
[8]  
LANG DV, 1984, J NON-CRYST SOLIDS, V66, P217, DOI 10.1016/0022-3093(84)90323-5
[9]   DETERMINATION OF THE DENSITY OF STATES OF THE CONDUCTION-BAND TAIL IN HYDROGENATED AMORPHOUS-SILICON [J].
LONGEAUD, C ;
FOURNET, G ;
VANDERHAGHEN, R .
PHYSICAL REVIEW B, 1988, 38 (11) :7493-7510