ELECTRON TRANSMISSION THROUGH NISI2-SI INTERFACES

被引：36

作者：

STILES, MD ^{[1
]}

HAMANN, DR ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

PHYSICAL REVIEW B | 1989年 / 40卷 / 02期

关键词：

D O I：

10.1103/PhysRevB.40.1349

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1349 / 1352

页数：4

共 20 条

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