DESIGN AND FABRICATION OF MULTILEVEL DIFFRACTIVE OPTICAL-ELEMENTS (DOES) AND HOLOGRAPHIC OPTICAL-ELEMENTS (HOES)

被引：3

作者：

STEMMER, A

ZARSCHIZKY, H

KNAPEK, E

LEFRANC, G

SCHERERWINNER, H

机构：

[1] Siemens AG, Corporate Research and Development, D-8000 München 83

来源：

MICROELECTRONIC ENGINEERING | 1993年 / 21卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(93)90113-J

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this report we describe the design, calculation and fabrication of binary and multilevel DOEs. In particular we pay attention to the direct write ebeam process and the pattern transfer into Si-substrates by reactive ion etching. First results can be given in terms of the diffraction efficiency and image quality of binary DOEs applied in test circuits for light coupling and free space light transfer with a multifunctional HOE.

引用

页码：471 / 474

页数：4

共 6 条

[1]

Zarschizky, Gerndt, Stemmer, Schneider, SPIE, 1732, (1992)

[2]

Karstensen, Laser Diode to Single-Mode Fiber Coupling with Ball Lenses, Journal of Optical Communications, 9, (1988)

[3]

Swanson, Veldkamp, Opt. Eng., 24, (1985)

[4]

Stemmer, Zarschizky, Et al., SPIE, 1732, (1992)

[5]

Hintermaier, Et al., Proximity correction using computer aided proximity correction (CAPROX): Evaluation and application, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 9 B, (1991)

[6]

Hintermaier, Franosch, Knapek, Stemmer, Microelectronic Eng., 13, (1991)

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