STRUCTURE OF SILICON OXIDE FILMS

[1] A STUDY OF AMORPHOUS SIO [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1959, 63 (07) : 1119 - 1120

[2] RESPONSE OF SI AND GAP P-N JUNCTIONS TO A 5- TO 40-KEV ELECTRON BEAM [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (11) : 4236 - &

[3] FILIPOVICH VN, 1955, ZH TEKH FIZ+, V25, P1622

[4] FILIPOVICH VN, 1955, ZH TEKH FIZ+, V25, P1604

[5] GROTHEIM K, 1958, GLASS IND, V38, P201

[6] HIROSE H, 1964, JPN J APPL PHYS, V3, P179

[7] James R., 1962, OPTICAL PRINCIPLES D

[8] INTERNAL MOTION AND MOLECULAR STRUCTURE STUDIES BY ELECTRON DIFFRACTION [J]. JOURNAL OF CHEMICAL PHYSICS, 1949, 17 (11) : 1052 - 1058

[9] KARLE IL, 1950, J CHEM PHYSICS, V18, P957

[10] Ritter E., 1962, J MOD OPTIC, V9, P197, DOI [10.1080/713826414, DOI 10.1080/713826414]

[1] A STUDY OF AMORPHOUS SIO [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1959, 63 (07) : 1119 - 1120

[2] RESPONSE OF SI AND GAP P-N JUNCTIONS TO A 5- TO 40-KEV ELECTRON BEAM [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (11) : 4236 - &

[3] FILIPOVICH VN, 1955, ZH TEKH FIZ+, V25, P1622

[4] FILIPOVICH VN, 1955, ZH TEKH FIZ+, V25, P1604

[5] GROTHEIM K, 1958, GLASS IND, V38, P201

[6] HIROSE H, 1964, JPN J APPL PHYS, V3, P179

[7] James R., 1962, OPTICAL PRINCIPLES D

[8] INTERNAL MOTION AND MOLECULAR STRUCTURE STUDIES BY ELECTRON DIFFRACTION [J]. JOURNAL OF CHEMICAL PHYSICS, 1949, 17 (11) : 1052 - 1058

[9] KARLE IL, 1950, J CHEM PHYSICS, V18, P957

[10] Ritter E., 1962, J MOD OPTIC, V9, P197, DOI [10.1080/713826414, DOI 10.1080/713826414]