MOS3 THIN-FILM CATHODES PREPARED BY CHEMICAL VAPOR-DEPOSITION

被引：14

作者：

SCHLEICH, DM ^{[1
]}

CHANG, HS ^{[1
]}

BARBERIO, YL ^{[1
]}

HANSON, KJ ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 11期

关键词：

D O I：

10.1149/1.2096437

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：3274 / 3278

页数：5

共 12 条

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[10] STRUCTURAL DESTABILIZATION INDUCED BY LITHIUM INTERCALATION IN MOS2 AND RELATED-COMPOUNDS [J].

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