ISOTOPE EFFECT IN THE DIFFUSION OF THE STABLE GERMANIUM ISOTOPES IN COPPER

被引：14

作者：

HEHENKAMP, T ^{[1
]}

LODDING, A ^{[1
]}

ODELIUS, H ^{[1
]}

SCHLETT, V ^{[1
]}

机构：

[1] CHALMERS TEKNISKA HOGSKOLA,GOTHENBURG,SWEDEN

来源：

ACTA METALLURGICA | 1979年 / 27卷 / 05期

关键词：

D O I：

10.1016/0001-6160(79)90117-2

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

The isotope effect of Ge diffusion in Cu has been measured employing the stable non-radioactive Ge isotopes. The evaluation of the diffusion profile and the isotope ratios was performed by a SIMS technique, sputtering with O2+ ions and collecting and mass-separating GeO2- ions. The results obtained in this way for several mass combinations for the first time, agree within a narrow margin or error with data derived earlier from the radioactive tracers Ge 68 and Ge 77. © 1979.

引用

页码：829 / 832

页数：4

共 11 条

[1] ELECTRODEPOSITION AND ELECTROWINNING OF GERMANIUM [J].