SPECTROSCOPIC PROPERTIES OF WO3 THIN-FILMS - POLARIZED FT-IR ATR, X-RAY-DIFFRACTION, AND ELECTRONIC ABSORPTION

被引：30

作者：

TAYLOR, TA ^{[1
]}

PATTERSON, HH ^{[1
]}

机构：

[1] UNIV MAINE, DEPT CHEM, ORONO, ME 04469 USA

来源：

APPLIED SPECTROSCOPY | 1994年 / 48卷 / 06期

关键词：

TUNGSTEN TRIOXIDE THIN FILMS; INFRARED ABSORPTION SPECTROSCOPY; POLARIZED FT-IR ATR SPECTROSCOPY; X-RAY DIFFRACTION;

D O I：

10.1366/000370294774368992

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The Fourier transform infrared/micro-attenuated total reflectance (FT-IR/mATR), X-ray diffraction (XRD), and electronic absorption properties of thin tungsten oxide films are characterized. Thin films of tungsten oxide (100-500 angstrom) deposited on SiO2 exhibit a different orientation or structure than thicker films. A p-polarized longitudinal optical (LO) mode at 970 cm-1 occurs in all ATR spectra of WO3 thin films and is one of the strongest IR bands in the spectra. The spectroscopic properties of tungsten oxide films are characterized as a function of substrate and heat treatment.

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页码：674 / 677

页数：4

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