2D AND 3D THIN-FILM FORMATION AND GROWTH MECHANISMS IN METAL ELECTROCRYSTALLIZATION - AN ATOMISTIC VIEW BY IN-SITU STM

被引：73

作者：

LORENZ, WJ

STAIKOV, G

机构：

[1] Institute of Physical Chemistry and Electrochemistry, University of Karlsruhe

来源：

SURFACE SCIENCE | 1995年 / 335卷 / 1-3期

关键词：

ADATOMS; ADSORPTION ISOTHERMS; ADSORPTION KINETICS; ATOMIC FORCE MICROSCOPY; CADMIUM; CLUSTERS; COATINGS; CRYSTALLIZATION; EPITAXY; EXTENDED X-RAY ABSORPTION FINE STRUCTURE (EXAFS); GOLD; GRAPHITE; GROWTH; LEAD; LOW INDEX SINGLE CRYSTAL SURFACES; METAL-ELECTROLYTE INTERFACES; METAL-METAL NONMAGNETIC HETEROSTRUCTURES; METAL-METAL NONMAGNETIC THIN FILM STRUCTURES; NUCLEATION; SCANNING TUNNELING MICROSCOPY; SILVER; SOLID-LIQUID INTERFACES; SUPERLATTICES; SURFACE DEFECTS; THALLIUM;

D O I：

10.1016/0039-6028(95)00576-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Different nucleation and growth mechanisms (Volmer-Weber, Frank-van der Merwe, and Stranski-Krastanov) have been found to operate in electrocrystallization and ultra-thin film formation of metals, Me, on foreign substrates, S, where 2D UPD Me adlayers on S can act as precursors for the subsequent nucleation and growth. Modern techniques, particularly in situ STM with lateral atomic resolution, give direct insight into the initial steps of the formation of 2D UPD Me adlayers, thin Me films, and 3D Me bulk phases.

引用

页码：32 / 43

页数：12

共 49 条

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