STRAIN AT SI-SIO2 INTERFACES STUDIED BY MICRO-RAMAN SPECTROSCOPY

被引：38

作者：

BRUNNER, K ^{[1
]}

ABSTREITER, G ^{[1
]}

KOLBESEN, BO ^{[1
]}

MEUL, HW ^{[1
]}

机构：

[1] SIEMENS AG,FORSCHUNGSLAB,D-8000 MUNICH 83,FED REP GER

来源：

APPLIED SURFACE SCIENCE | 1989年 / 39卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(89)90424-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：116 / 126

页数：11

共 19 条

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