THE LOGARITHMIC RESPONSE OF PALLADIUM-GATE METAL-INSULATOR-SILICON FIELD-EFFECT TRANSISTORS TO HYDROGEN

被引:18
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ROBINS, I
ROSS, JF
SHAW, JEA
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10.1063/1.337387
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O59 [应用物理学];
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页码:843 / 845
页数:3
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共 9 条
[1]  
GUGGENHEIM EA, 1959, THERMODYNAMICS, pCH9
[2]  
JANATA J, 1980, ION SELECTIVE ELECTR, V2, P142
[3]   HYDROGEN-SENSITIVE MOS FIELD-EFFECT TRANSISTOR [J].
LUNDSTROEM, I ;
SHIVARAMAN, S ;
SVENSSON, C ;
LUNDKVIST, L .
APPLIED PHYSICS LETTERS, 1975, 26 (02) :55-57
[4]   HYDROGEN SENSITIVE MOS-STRUCTURES .1. PRINCIPLES AND APPLICATIONS [J].
LUNDSTROM, I .
SENSORS AND ACTUATORS, 1981, 1 (04) :403-426
[5]   HYDROGEN SENSITIVE MOS-STRUCTURES .2. CHARACTERIZATION [J].
LUNDSTROM, I ;
SODERBERG, D .
SENSORS AND ACTUATORS, 1981, 2 (02) :105-138
[6]  
LUNDSTROM I, 1975, J APPL PHYS, V49, P2876
[7]  
MOORE WJ, 1972, PHYSICAL CHEM, P500
[8]   HYDROGEN ADSORPTION STATES AT THE EXTERNAL AND INTERNAL PALLADIUM SURFACES OF A PALLADIUM-SILICON DIOXIDE-SILICON STRUCTURE [J].
PETERSSON, LG ;
DANNETUN, HM ;
FOGELBERG, J ;
LUNDSTROM, I .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (01) :404-413
[9]  
ROBINS I, UNPUB