DC REACTIVE MAGNETRON SPUTTERED ZNO FILMS

This paper is concerned with a new reactive magnetron sputtering technique using a zinc target and 100% oxygen gas. A solenoid coil around a bell jar was used to cause an increase in the parallel component of the leakage magnetic lines to the target surface. Highly oriented ZnO films (c-axis orientation) were fabricated on glass substrates at very high deposition rates (10 μm/h). The quality of the ZnO film was determined by X-ray diffraction, reflection electron diffraction, and scanning electron microscopy (SEM). Well-oriented ZnO films were obtained at relatively high oxygen pressures from 0.2 to 0.4 Torr. This sputtering system is more convenient than other existing sputtering systems. © 1979.