ESCAPE DEPTH OF PHOTOELECTRONS

被引:20
作者
JABLONSKI, A
机构
[1] Institute of Physical Chemistry, Polish Academy of Sciences, Warszawa, 01-224
关键词
D O I
10.1002/sia.740211104
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The sampling depth of electron spectroscopies, AES and XPS, is frequently directly associated with the value of the inelastic mean free path (IMFP). Owing to elastic scattering of signal electrons, a separate parameter, the escape depth (ED), should be used to describe the analysed volume. There is no simple relation between the ED and the IMFP. In the present work, extensive Monte Carlo calculations were performed to calculate the ED for photoelectrons emitted from gold (Au 4s, Au 4p(3/2), Au 4d(5/2) and Au 4f(7/2)). All XPS configurations within a plane normal to the surface were considered. It has been found that the anisotropy of photoelectron emission is strongly reflected in the angular dependences of the ED. Furthermore, the value of ED divided by the cosine of the detection angle, which is equivalent to the attenuation length (AL) described by one of the definitions, may considerably exceed the IMFP, in contrast with common expectations. This occurs at large detection angles and/or in experimental configurations with the direction of x-rays close to the direction towards the analyser. A simple and accurate parameterization was proposed in the present work, taking into account the anisotropy of photoemission, from which the ED can be predicted for photoelectrons considered and for any XPS configuration.
引用
收藏
页码:758 / 763
页数:6
相关论文
共 22 条
[1]  
Band I. M., 1979, Atomic Data and Nuclear Data Tables, V23, P443, DOI 10.1016/0092-640X(79)90027-5
[2]   NEW TECHNIQUE FOR INVESTIGATION OF ANGULAR-DISTRIBUTION OF PHOTOEMISSION FROM SOLIDS - DEMONSTRATION OF THE EFFECT OF ELASTIC-SCATTERING [J].
BASCHENKO, OA ;
MACHAVARIANI, GV ;
NEFEDOV, VI .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1984, 34 (03) :305-308
[3]   POLARIZATION BY MERCURY OF 100 TO 2000 EV ELECTRONS [J].
BUNYAN, PJ ;
SCHONFELDER, JL .
PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1965, 85 (545P) :455-+
[4]   CALCULATION OF ESCAPE DEPTHS FROM INELASTIC MEAN FREE PATHS [J].
EBEL, H ;
POHN, C ;
SVAGERA, R ;
WERNLE, ME ;
EBEL, MF ;
JABLONSKI, A .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1990, 50 (1-2) :109-116
[5]   TAKE-OFF ANGLE AND FILM THICKNESS DEPENDENCES OF THE ATTENUATION LENGTH OF X-RAY PHOTOELECTRONS BY A TRAJECTORY REVERSAL METHOD [J].
GRIES, WH ;
WERNER, W .
SURFACE AND INTERFACE ANALYSIS, 1990, 16 (1-12) :149-153
[6]   COMPARISON OF THE ATTENUATION LENGTHS AND THE INELASTIC MEAN FREE-PATH FOR PHOTOELECTRONS IN SILVER [J].
JABLONSKI, A ;
TOUGAARD, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (01) :106-116
[7]   ELASTIC ELECTRON BACKSCATTERING FROM GOLD [J].
JABLONSKI, A .
PHYSICAL REVIEW B, 1991, 43 (10) :7546-7554
[8]   ANGULAR-DISTRIBUTION OF PHOTOEMISSION FROM AMORPHOUS AND POLYCRYSTALLINE SOLIDS [J].
JABLONSKI, A ;
ZEMEK, J .
PHYSICAL REVIEW B, 1993, 48 (07) :4799-4805
[9]   COMPARISON OF ELECTRON ATTENUATION LENGTHS AND ESCAPE DEPTHS WITH INELASTIC MEAN FREE PATHS [J].
JABLONSKI, A ;
EBEL, H .
SURFACE AND INTERFACE ANALYSIS, 1988, 11 (12) :627-632
[10]   DATABASE OF RELATIVISTIC ELASTIC-SCATTERING CROSS-SECTIONS FOR CALCULATIONS OF PHOTOELECTRON AND AUGER-ELECTRON TRANSPORT [J].
JABLONSKI, A ;
TOUGAARD, S .
SURFACE AND INTERFACE ANALYSIS, 1994, 22 (1-12) :129-133