GRAIN-BOUNDARY DEFECTS IN BLOCK-COPOLYMER SYSTEMS - BULK AND THIN-FILM RESULTS

被引：13

作者：

CARVALHO, BL ^{[1
]}

LESCANEC, RL ^{[1
]}

THOMAS, EL ^{[1
]}

机构：

[1] MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139

来源：

MACROMOLECULAR SYMPOSIA | 1995年 / 98卷

关键词：

D O I：

10.1002/masy.199509801101

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Ordered periodic morphologies are the hallmark of most discussions of the microphase-separated state in block copolymer systems yet actual materials contain a myriad of defects. Perhaps the most important of these defects are those which constitute the regions between ordered grains. Transmission electron microscopy (TEM) is used to investigate the grain boundary morphology of diblock copolymers in both bulk and thin film geometries. These experiments show that constant mean curvature (CMC) surfaces are often useful descriptors, not only for the equilibrium morphology of microphase-separated copolymers, but also for the microphase-separated morphology within grain boundaries.

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页码：1131 / 1146

页数：16

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