THE DUPLEX STRUCTURE OF CELL-WALLS OF POROUS ANODIC FILMS FORMED ON ALUMINUM

被引：61

作者：

ONO, S

MASUKO, N

机构：

[1] Institute of Industrial Science, The University of Tokyo, Minato-ku, Tokyo, 106, Roppongi

来源：

CORROSION SCIENCE | 1992年 / 33卷 / 03期

关键词：

D O I：

10.1016/0010-938X(92)90078-H

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The depth and the amount of anion incorporation into the cell walls of porous anodic films formed in a phosphoric acid solution have been studied using TEM and EDX. Both increased with increasing forming voltage; however, a duplex structure could not confirmed for films formed at voltages below 10V.

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页码：503 / &

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