A UHV EVAPORATOR FOR LEED AND AUGER EMISSION STUDIES

被引：3

作者：

PRUTTON, M

TOKUTAKA, H

机构：

[1] Physics Department, University of York, Heslington, York

来源：

THIN SOLID FILMS | 1969年 / 3卷 / 06期

关键词：

D O I：

10.1016/0040-6090(69)90056-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A Knudsen source is described for the evaporation of a variety of metals. It has been calibrated for silver between 0.3 Å/min and 10 Å/min and can be used in UHV. A substrate multiple-cleavage attachment for mounting on a specimen manipulator in UHV is also described. This attachment provides for rotation, translation, heating, cooling and cleavage of single crystals and has been used for NaCl, KCl and LiF. © 1969.

引用

页码：411 / &

共 5 条

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