EPITAXIAL GROWTH OF LEAD TIN TELLURIDE

被引：66

作者：

HOLLOWAY, H

LOGOTHETIS, EM

WILKES, E

机构：

来源：

关键词：

D O I：

10.1063/1.1659456

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3543 / +

页数：1

共 18 条

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