FILM DEPOSITION BY LASER-INDUCED VACUUM-ARC EVAPORATION

被引：33

作者：

SCHEIBE, HJ

SIEMROTH, P

机构：

[1] Zentralinstitut fuer, Festkorperphysik und, Werkstofforschung der AdW, Dresden

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 1990年 / 18卷 / 06期

关键词：

D O I：

10.1109/27.61503

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Recent results of a study of the deposition process and the technological development of laser-arc are presented. Studies of the influence of arc current on film deposition were carried out for Ti, TiC, and C. On the basis of these results, specific multilayered structures have been prepared. As an example, a Ti/TiC multilayer system with 25-nm single layers is described. Results of structural and chemical analysis by means of Auger electron spectroscopy (AES) are presented. They show that diamond-like carbon film with a refractive index in the range of between 2.05 and 2.5 can be deposited effectively.

引用

页码：917 / 922

页数：6

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