INVESTIGATION OF SURFACE-DIFFUSION OF HF ON W(100) BY THE DENSITY FLUCTUATION METHOD

被引：5

作者：

BEBEN, J

GUBERNATOR, W

机构：

[1] Institute of Experimental Physics, Wrocław University, PL 50-205 Wrocław

来源：

SURFACE SCIENCE | 1994年 / 304卷 / 1-2期

关键词：

D O I：

10.1016/0039-6028(94)90752-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Surface diffusion of hafnium deposited in ultrahigh vacuum onto a microcrystal of tungsten was investigated using the field emission method of density fluctuations. Surface diffusion coefficients were determined by analysis of the experimental time autocorrelation functions measured in the temperature range 370-470 K. Values of the activation energy for the surface diffusion of Hf on W, 0.53 and 0.54 eV were obtained for two series of measurements performed under similar conditions of deposition of Hf submonolayers.

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页码：59 / 64

页数：6

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