THICK YTTRIUM-IRON-GARNET (YIG) FILMS PRODUCED BY PULSED-LASER DEPOSITION (PLD) FOR INTEGRATION APPLICATIONS

High magnetic and dielectric quality, thick (50-100 mu m), epitaxial, yttrium-iron-garnet (YIG) films were deposited at high rate by PLD, A two-step (low temperature deposition followed by rapid thermal anneal) low thermal budget PLD process was demonstrated suitable to deposit thick polycrystalline YIG films on metallized Si and GaAs. A modified PLD apparatus is used to deposit uniform, 80-100 mu m, thick YIG films on 3-inch semiconductor wafers for integrated microwave circulator fabrication.